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![[Translate to chinese:] Area of a printed circuit board (PCB) which was imaged with extended depth of field (EDOF) using digital microscopy.](/fileadmin/_processed_/e/e/csm_PCB_imaged_with_EDOF_using_digital_microscopy_228d815bd1.jpg "[Translate to chinese:] Area of a printed circuit board (PCB) which was imaged with extended depth of field (EDOF) using digital microscopy.")
如何形成清晰的图像
在显微镜检查中，景深常被看做经验参数。在实际操作中，会根据数值孔径、分辨率和放大率之间的相关性确定该参数。为了获得最佳视觉效果，现代显微镜的调节设备在景深和分辨率之间实现了最佳平衡，这两个参数在理论上呈负相关。
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![[Translate to chinese:] These images show the microstructure of a hard metal with 10% cobalt which is used for heavy-duty tools. The large increase in magnification of the right image (compared to the left) has a risk of being outside the useful range or, in other words, empty magnification.](/fileadmin/_processed_/d/b/csm_Microstructure_of_a_hard_metal_which_is_used_for_heavy-duty_tools_69233d4576.jpg "[Translate to chinese:] Microstructure of a hard metal with 10% cobalt which is used for heavy-duty tools.")
当心“无效”放大率
在一个最简化的情况，光学显微镜由一个靠近标本的透镜（物镜）和一个靠近眼睛的透镜（目镜）组成。显微镜放大率是两个显微镜透镜系数的乘积。比如，40倍物镜和10倍目镜可以得到400倍放大率。
![[Translate to chinese:] Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illumination.](/fileadmin/_processed_/9/1/csm_Processed_wafer_standard_and_oblique_brightfield_illumination_556d919235.jpg "[Translate to chinese:] Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illuminati")
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浸没式物镜
要用显微镜在高倍镜下检查试样标本，有许多因素需要考虑。其中包括分辨率、数字光圈数值孔径（NA）、物镜的工作距离以及物镜前透镜采集图像所用介质的折射率。在这篇文章中，我们将简要地看一下如何使用浸泡介质在盖玻片和物镜前透镜之间利用浸泡介质帮助提高NA和分辨率。此外，我们还将考虑空气和构成载玻片和、盖玻片的空气和玻璃的折射率，以及当光从一种介质传播到另一种介质时，如何使用浸没介质部分地减少失错配。此外，…
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![[Translate to chinese:] Intensity distribution (arbitrary color coding) of an image of two points where the distance between them corresponds to the Rayleigh criterion.](/fileadmin/_processed_/3/1/csm_Intensity_distribution_Rayleigh_criterion_e5f9410ee3.jpg "[Translate to chinese:] Intensity distribution (arbitrary color coding) of an image of two points where the distance between them corresponds to the Rayleigh criterion.")
显微镜分辨率：概念、因素和计算
在显微镜学中，‘分辨率’一词用于阐述显微镜对细节进行区分的能力。换言之，这是样本内两个能被观察人员或者显微镜摄像头区分的实体点之间的最小距离。显微镜的分辨率本质上与光学元件的数值孔径（NA）以及用于观察样本标本的光波长有关。此外，我们必须考虑Ernst Abbe于1873年首次提出的衍射极限。本文章包含了这些概念的历史介绍并使用相对简单的术语对其进行了解释。
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如何提高微电子元件检测性能
在检查硅片或微机电系统时，你需要看更多吗？你想得到与电子显微镜相似的清晰详细的样本图像吗？
观看这个免费的网络研讨会，了解更多关于强大的成像和对比技术，可以提高您的检查性能。您将了解如何克服分辨率标准，而不需要浸油或转移到SEM，以实现您想要的检测结果。
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![[Translate to chinese:] Mouse kidney section with Alexa Fluor™ 488 WGA, Alexa Fluor™ 568 Phalloidin, and DAPI. Sample is a FluoCells™ prepared slide #3 from Thermo Fisher Scientific, Waltham, MA, USA. Images courtesy of Dr. Reyna Martinez – De Luna, Upstate Medical University, Department of Ophthalmology.](/fileadmin/_processed_/3/a/csm_The_Power_of_Pairing_Adaptive_Deconvolution_teaser_6ab6b726a1.jpg "[Translate to chinese:] Image: Mouse kidney section with Alexa Fluor™ 488 WGA, Alexa Fluor™ 568 Phalloidin, and DAPI. Sample is a FluoCells™ prepared slide #3 from Thermo Fisher Scientific, Waltham, MA, USA.")
自适应反卷积与 Computational Clearing 结合的力量
反卷积是一种计算方法，用于恢复被点扩散函数（PSF）和噪声源破坏的物体图像。在本技术简介中，您将了解徕卡显微系统提供的反卷积算法如何帮助您克服宽视场 (WF) 荧光显微镜中由于光的波动性和光学元件对光的衍射而造成的图像分辨率和对比度损失。探索由用户控制或自动反卷积的方法，查看并解析更多的结构细节。
![[Translate to chinese:] Spherical aberration describes the fact that waves which pass through the centre of the lens are refracted less than the waves which pass through the edges of the curved lens.](/fileadmin/_processed_/1/1/csm_Spherical_aberration_with_optical_lens_baf670b5cb.jpg "[Translate to chinese:] Spherical aberration describes the fact that waves which pass through the centre of the lens are refracted less than the waves which pass through the edges of the curved lens.")
