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本文介绍了一种配备自动化和可重复的DIC（微分干涉对比）成像的6英寸晶圆检测显微镜，无论用户的技能水平如何。制造集成电路（IC）芯片和半导体组件需要进行晶圆检测，以验证是否存在影响性能的缺陷。这种检测…
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![[Translate to chinese:] Optical microscope image, which is a composition of both brightfield and fluorescence illumination, showing organic contamination on a wafer surface. The inset images in the upper left corner show the brightfield image (above) and fluorescence image (below with dark background).](/fileadmin/_processed_/a/1/csm_Organic_contamination_on_a_wafer_surface_7072894d1c.jpg "[Translate to chinese:] Optical microscope image, which is a composition of both brightfield and fluorescence illumination, showing organic contamination on a wafer surface.")
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![[Translate to chinese:] Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illumination.](/fileadmin/_processed_/9/1/csm_Processed_wafer_standard_and_oblique_brightfield_illumination_c01940e12e.jpg "[Translate to chinese:] Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illuminati")
