![[Translate to chinese:] Wafer Wafer.jpg](/fileadmin/_processed_/8/8/csm_Wafer_ac13ab1fa0.jpg "[Translate to chinese:] Wafer")
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6英寸晶圆检测显微镜：可靠观察细微高度差异
本文介绍了一种配备自动化和可重复的DIC（微分干涉对比）成像的6英寸晶圆检测显微镜，无论用户的技能水平如何。制造集成电路（IC）芯片和半导体组件需要进行晶圆检测，以验证是否存在影响性能的缺陷。这种检测…
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![[Translate to chinese:] Optical microscope image, which is a composition of both brightfield and fluorescence illumination, showing organic contamination on a wafer surface. The inset images in the upper left corner show the brightfield image (above) and fluorescence image (below with dark background).](/fileadmin/_processed_/a/1/csm_Organic_contamination_on_a_wafer_surface_7072894d1c.jpg "[Translate to chinese:] Optical microscope image, which is a composition of both brightfield and fluorescence illumination, showing organic contamination on a wafer surface.")
晶圆上的光刻胶残留和有机污染物的可视化
随着半导体上集成电路（IC）的尺寸低于10纳米，在晶圆检测中有效检测光刻胶残留等有机污染物和缺陷变得越来越重要。光学显微镜仍然是常见的检测方法，但对于有机污染物，明场和其他类型的照明可能会存在局限性。…
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![[Translate to chinese:] Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illumination.](/fileadmin/_processed_/9/1/csm_Processed_wafer_standard_and_oblique_brightfield_illumination_c01940e12e.jpg "[Translate to chinese:] Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illuminati")
